52X0.2E1, 52X0.2E2, and 52X0.2D1 Pseudo-Apertures

Description

These pseudo-apertures are the same physical aperture as the 52X0.2 aperture, but are used to place the target at different locations on the detectors to reduce CTE loss or FUV-MAMA background. The throughputs of the E1 and D1 apertures as a function of wavelength are similar to those of the corresponding regular positions. However, there is some vignetting of the gratings that changes the overall system throughput slightly with varying position along the slit. At the E1 positions, the overall low dispersion throughputs are decreased by 2 to 3%, while at the D1 position the G140L throughput is increased by 2 to 7%. Throughput changes for the medium resolution gratings are not well characterized, but should be similar. Since these throughput changes depend on the grating and the position on the detector, they are handled in the pipeline calibration by the use of low-order flat fields (lfl files) rather than by a change in aperture throughput curve. Throughput at the 52X0.2E2 position is about 20% lower than that at the 52X0.2E1 position. The usage of these slits is supported only for certain modes, as listed in the table below.

 

 

 

 

Special Considerations

Same special considerations as for the 52X0.2 aperture apply to these pseudo-apertures. See reference information on previous page.

Aperture	Detector	Allowed Gratings	Usage
52X0.2E1	CCD	All CCD gratings	Places the target at row ~900 to minimize CTE effects
52X0.2E2	CCD	G750L and G750M	Places the target at row ~900 to minimize CTE effects; positions are offset from the physical aperture, to give better alignment with fringe flats done using 52X0.1 aperture
52X0.2D1	FUV-MAMA	G140L and G140M	Places the target 2±1″ (G140L) or 4±1″ (G140M) above the bottom edge of FUV-MAMA; intended for observations of very faint targets where dark current contribution should be minimized